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Inorganic oxide fine particle dispersion , abrasive particle dispersion and polishing composition

机译:无机氧化物细颗粒分散体,磨料颗粒分散体和抛光组合物

摘要

PROBLEM TO BE SOLVED: To provide dispersion liquid showing excellent polishing speed (polishing rate) and dispersed with polishing particles capable of remarkably suppressing generation of linear traces on a surface of a base material to be polished.;SOLUTION: This inorganic oxide particulate dispersion liquid is composed by dispersing inorganic oxide particulates having an average particle diameter (D1) measured by a dynamic light scattering method in the range of 3-300 nm and specific surface area (Sa) in the range of 10-800 m2/g in a dispersant. The inorganic oxide particulates satisfy conditions that (1) the number of each of the inorganic oxide particulates having a minor axis/major axis ratio determined by a microscope is in the range of 0.3-0.8 is made in the range of 20-45% of the number of all the inorganic oxide particulates, and (2) the number of each of the inorganic oxide particulates having a minor axis/major axis ratio determined by an electronic microscope is in the range of ≤0.5 is made ≤10% of the number of all the inorganic oxide particulates.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种分散液,该分散液显示出优异的抛光速度(抛光速率),并分散有能够显着抑制待抛光基材表面上的线性痕迹的抛光颗粒。通过分散具有通过动态光散射法测得的平均粒径(D1)在3-300nm范围内和比表面积(Sa)在10-800m

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