Mixing with the aforementioned 1st liquid which possesses with 2 fluid nozzles, the substrate liquid central processing unit, the 1st liquid emission opening which emits

摘要

PROBLEM TO BE SOLVED: To provide a two-liquid nozzle capable of sufficiently processing liquid without damaging a surface of a substrate, a substrate liquid processing device and a substrate liquid processing method using the two-liquid nozzle, and a substrate liquid processing program.;SOLUTION: According to the present invention, a two-liquid nozzle (34) has a first liquid emission port (45) for emitting first liquid, and a gas emission port (47) for emitting gas, and mixes the first liquid emitted from the first liquid emission port (45) with the gas emitted from the gas emission port (47) outside, and sprays mixture fluid (52) toward a processed body (substrate 2). The two-fluid nozzle (34) has a second liquid emission port (53) for supplying second liquid to an outer edge on the body processed by the mixture fluid (52) sprayed to the processed body (substrate 2).;COPYRIGHT: (C)2013,JPO&INPIT