METHOD FOR PREPARING THIN FILM DEVICE AND METHOD FOR PREPARING COMMON MODE FILTER USING THE SAME

摘要

PROBLEM TO BE SOLVED: To improve alignment in a lithography process for a second conductive pattern, by making a first insulation layer planar to electrically insulate a first conductive pattern from the second conductive pattern in a thin film device.;SOLUTION: At least one first conductive pattern 33A to 33C are formed on a substrate 31. A dry polyimide film 37 is placed on the first conductive pattern 33A to 33C. Force is applied to the dry polyimide film 37 such that the dry polyimide film 37 fills space 41 in the first conductive pattern 33A to 33C. At least one second conductive pattern 43A to 43C is formed on the dry polyimide film 37, to prepare the thin film device.;COPYRIGHT: (C)2014,JPO&INPIT