Inspection equipment of inspection method and photomask group of photomask group

摘要

PROBLEM TO BE SOLVED: To provide an inspection method for a photomask and an inspection apparatus for a photomask, for determining a defect of a photomask for double patterning and verifying a degree of influences by defects.;SOLUTION: The inspection method for a photomask group for forming a drawing pattern by use of a plurality of photomasks includes: a photomask image obtaining step of obtaining photomask images of a plurality of photomasks; an image superimposing step of superimposing the photomask images to obtain a superimposed image; and an inspection step of inspecting influences of the superimposed image on the drawing pattern.;COPYRIGHT: (C)2011,JPO&INPIT