Lasertec's Photomask Inspection System Rates High on Sensitivity Checking

摘要

Lasertec Corp. has brought to the market the MATRICS X700 Series photomask inspection system compatible with photomasks for semiconductor devices at 45nm design rule and beyond. The company started to accept orders for the new product in September. As a leading company in the field of photomask inspection system, Lasertec has a long history and abundant experience in this area since it started to develop and commercialize the world's first photomask inspection system in 1976.