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Production method of the colloidal crystal film, the colloidal crystal film obtained by the method, and the colloidal crystal pigments obtained by using the same

机译:胶体晶体膜的制造方法,通过该方法获得的胶体晶体膜和使用该方法获得的胶体晶体颜料

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently producing, using a spay coating technique, a colloidal crystal film being fully smooth and having reflection peak of sufficiently high reflectivity in its reflection spectrum, and enabling a large-area film formation irrespective of the base material's form.;SOLUTION: The method for producing the colloidal crystal film incudes: the step of spray-coating a base material with a colloidal dispersion including: a dispersion medium component including at least one substance selected from the group consisting of monomers and polymers; and colloidal particles having an average size of 0.01-10 μm and a monodisperse degree represented by relationship (1): {monodisperse degree (unit:%)}=({the standard deviation of particle sizes}/{average particle size})×100 of 20% or less; wherein the colloidal particles are dispersed in a three-dimensional regular array state having reflection peak in the reflection spectrum in the dispersion medium component, and having a viscosity of 10-100 mPa s as determined at a shearing rate of 1,000 s-1 at 25±0.1°C; so as to be 25-45 μm in the average thickness after polymerization to form a coating film on the base material; and the step of polymerizing the dispersion medium in the coating film to produce the objective colloidal crystal film with an average thickness of 25-45 μm immobilized in the form of a polymer on the base material.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种使用水密涂布技术有效地生产胶体晶体膜的方法,该胶体晶体膜是完全光滑的并且在其反射光谱中具有足够高的反射率的反射峰,并且能够形成大面积的膜而与解决方案:制备胶体晶体膜的方法包括:用胶体分散体喷涂基体材料的步骤,所述胶体分散体包括:分散介质组分,其包含至少一种选自单体和聚合物的物质;胶体粒子的平均粒径为0.01〜10μm,单分散度由关系式(1)表示:{单分散度(单位:%)} =({粒径的标准偏差} / {平均粒径} )× 20%或以下的100;其中,胶体颗粒以三维规则阵列状态分散,该三维规则阵列状态在分散介质组分中的反射光谱中具有反射峰,并且以1,000 s的剪切速率测定具有10-100 mPa s的粘度。 1 在25°C和0.1°C;聚合后在基材上形成涂膜的平均厚度为25〜45μm。以及使涂膜中的分散介质聚合以制备平均厚度为25-45μm的目标胶体晶体膜的步骤,该目标胶体晶体膜以聚合物的形式固定在基材上。COPYRIGHT:(C)2011,日本特许厅

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