Configuration thing null cocoyl sarcosine

摘要

PROBLEM TO BE SOLVED: To provide a constituent of chemico-mechanical polishing for improving the planarization effects of a polishing object.;SOLUTION: The constituent of chemico-mechanical polishing includes, at least dazolinone-based compound, triazole-based compound or their admixture or sarcosine and its salt compound, or their admixture. This constituent of inhibitor is applied to chemico-mechanical polishing; and while a high polishing removal rate of a metallization layer is being maintained, it has the property of suppressing metal etching, so that polishing failures, such as overpolishing and erosion, can be reduced.;COPYRIGHT: (C)2010,JPO&INPIT