Modeling method and thickness measurement method using the same reflection of size distribution curve, as well as the thickness measurement reflectometer

摘要

Topic As for this invention, the band being passed, inside fixed wave length zone in case of the light which incidence is done, by the fact that the modeling it does degree of reflected distribution curve of the light which is reflected making use of the system which you integrate inside wave length zone, by thin film layer, modeling method of the degree of reflected distribution curve which the modeling can do the degree of reflected distribution curve which is approached to the degree of reflected distribution curve which is obtained by actual measurement substantially mathematically and thickness measuring method, and the thickness measurement reflected meter which utilize this are offered.SolutionsAs for this invention, being modeling method of degree of reflected distribution curve and the thickness measuring method which utilizes this, and something regarding thickness measurement reflected system, as for modeling method of the degree of reflected distribution curve due to this invention, being modeling method of the degree of reflected distribution curve which degree of reflection distribution of the thin film layer which accompanies the change of wave length of light vis-a-vis the thin film layer of fixed thickness the modeling is done, degree of reflected distribution curve preparation step and the white light which prepare the degree of reflected distribution curve which shows the degree of reflection distribution of the above-mentioned thin film layer which accompanies the change of wave length of light the band it passes vis-a-vis specific wave length,Focusing on the wave length of the above-mentioned specification the intensity distribution curved line which shows the intensity distribution of light with fixed wave length zone preparing, the above-mentioned intensity distribution curved line inside the above-mentioned wave length zone integrating the input strength setting step which sets as input strength of the above-mentioned specific wave length and the compound intensity distribution curved line which connects the above-mentioned degree of reflected distribution curve and the above-mentioned intensity distribution curved line inside the above-mentioned wave length zone integrating the output strength setting step which sets as output strength of the above-mentioned specific wave length and the value which divides the output strength of the above-mentioned specific wave length at input strength of the above-mentioned specific wave length, it confronts the above-mentioned specific wave lengthWhile changing integral calculus degree of reflected setting step and the above-mentioned specific wave length which it sets as integral calculus degree of reflection of the above-mentioned thin film layer, formation step of integral calculus degree of reflected distribution curve which forms integral calculus degree of reflected distribution curve which shows the above-mentioned integral calculus degree of reflection distribution which over again, accompanies setting step of the above-mentioned input strength, setting step of the above-mentioned output strength, and setting step of the above-mentioned integral calculus degree of reflection the change of wave length it features that it includes and. Selective figure Figure 1