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Method for producing a surface sealing the silica-based particles, the surface sealing the silica-based particles and the semiconductor sealing resin composition comprising a mixture of particles

机译:制备表面密封二氧化硅基颗粒的方法,表面密封二氧化硅基颗粒和包含颗粒混合物的半导体密封树脂组合物

摘要

PROBLEM TO BE SOLVED: To provide a surface sealed silica particles, a method of producing thereof, and a resin composition for encapsulating a semiconductor constituted by mixing the particles.;SOLUTION: The surface sealed silica particles having moisture resistance is constituted by sealing fine pores existing on the surface of silica porous particles having an average particle size of 0.5-50 μm obtained by spray-drying a dispersion liquid containing silica fine particles having an average particle size of 2-300 nm with silica fine particles having an average particle size of 2-50 nm (including the silica fine particles whose particle surface is melted, the same hereinafter), and/or a molten matter thereof, or a dehydration condensation polymerization product of the silica fine particles and/or a molten matter thereof with silicic acid, or hydrolysis condensation polymerization product of the silica fine particles and/or a molten matter thereof with an organic silicon compound, and also provided is a method of producing thereof.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种表面密封的二氧化硅颗粒,其制备方法以及通过混合该颗粒而构成的用于封装半导体的树脂组合物。通过将含有平均粒径为2-300nm的二氧化硅细颗粒的分散液与具有平均粒径的二氧化硅细颗粒喷雾干燥而获得的平均粒径为0.5-50μm的二氧化硅多孔颗粒的表面上存在的二氧化硅颗粒。尺寸为2-50nm(包括其表面熔融的二氧化硅细颗粒,以下相同)和/或其熔融物,或二氧化硅细颗粒和/或其熔融物的脱水缩聚产物与硅酸,或二氧化硅细颗粒和/或其熔融物与有机硅化合物的水解缩聚产物,和还提供了其制造方法。版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP5480497B2

    专利类型

  • 公开/公告日2014-04-23

    原文格式PDF

  • 申请/专利权人 日揮触媒化成株式会社;

    申请/专利号JP20080335208

  • 发明设计人 荒尾 弘樹;濱崎 裕一;江上 美紀;

    申请日2008-12-26

  • 分类号C01B33/18;H01L23/29;H01L23/31;C08L63/00;C08K9/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:12:09

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