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2 processed disks of the methodological null both sides processed device in order to provide the respective even process layer with respect to
2 processed disks of the methodological null both sides processed device in order to provide the respective even process layer with respect to
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机译:方法学上的两个处理过的磁盘将双面处理设备设为空,以便针对
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摘要
PROBLEM TO BE SOLVED: To improve flatness and plane-parallelism of a working layer without removing a considerable amount of a material by trimming of the working layer.;SOLUTION: A double-side processing apparatus comprises: an upper working disk 13; a lower working disk 26 and a rolling apparatus, which are rotatably mounted about an axis of symmetry 28 of the double-side processing apparatus. This method comprises: a step of applying a lower intermediate layer 29 on a surface of the lower working disk 26 and an upper intermediate layer 16 on a surface of the upper working disks 13; and a step of simultaneously leveling both of the intermediate layers 16 and 29 by using three trimming apparatuses. Each of the trimming apparatuses comprises a trimming disk, one trimming body including an abrasive substance and an outer toothing, is moved on cycloidal paths by using the rolling apparatus and the outer toothing under pressure and with addition of a cooling lubricant that is free of substances having an abrasive action, and removes a material from the intermediate layers 16 and 29. The method further comprises a step of applying a lower working layer 32 to the lower intermediate layer 29 and an upper working layer 39 to the upper intermediate layer 16.;COPYRIGHT: (C)2012,JPO&INPIT
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