Method of measuring the electron microscope and defocus deviation or resolution limit

摘要

This invention regards the dehuokasu deviation of the electron microscope and the electron microscope or the measuring method of the resolution limit. When it inclines lighting, depending upon in case of the electron microscope it utilizes the fact that aberration and the dehuokasu deviation which exist depending on direction, change the intensity distribution in the diffraction pattern. Especially, the envelope in the diffraction pattern depending on direction, to narrow it converts. Inclination of the electron beam and depending upon when, the aberration which exists you understand, when you suppose, that focus distribution is gauss form, dehuokasu deviation of the electron microscope becomes the only unknown parameter which produces effect on the change which depends on the direction of intensity distribution. Therefore, it is possible to presume dehuokasu deviation quantitatively from the change. But, also there is no hypothesis from the beginning regarding the form the model with it is possible also from the narrow conversion which depends on direction to calculate focus distribution. That way, it is possible to calculate the resolution limit of the electron microscope.