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As extreme ultraviolet radiation emission is used, the lithography device which possesses the volatile organicity chemical compound absorption component which includes the getter material
As extreme ultraviolet radiation emission is used, the lithography device which possesses the volatile organicity chemical compound absorption component which includes the getter material
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机译:由于使用了极紫外线辐射,因此具有包括吸气材料的挥发性有机化合物吸收成分的光刻装置
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摘要
A lithography apparatus (10) is disclosed using extreme UV radiation and having a hydrocarbon sorbing member comprising a getter material arranged in the process chamber (13) of said apparatus.
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