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Harmonic Ratio Based Defect Classifier

机译:基于谐波比的缺陷分类器

摘要

The disclosure is directed to a system and method for detecting and classifying at least one media defect. A periodic pattern is written to a medium to yield at least one waveform. The magnitude of the waveform is compared against a defect threshold to detect the presence or absence of media defects in the medium. When at least one defect is detected, a magnitude for each of at least two harmonics of the waveform is determined in the defect range. The defect is classified by comparing a ratio of the magnitudes of the at least two harmonics against a classification threshold.
机译:本公开针对一种用于检测和分类至少一个介质缺陷的系统和方法。将周期性图案写入介质以产生至少一个波形。将波形的大小与缺陷阈值进行比较,以检测介质中是否存在介质缺陷。当检测到至少一个缺陷时,在缺陷范围内确定波形的至少两个谐波中的每个谐波的幅度。通过将至少两个谐波的幅度比与分类阈值进行比较来对缺陷进行分类。

著录项

  • 公开/公告号US2014140182A1

    专利类型

  • 公开/公告日2014-05-22

    原文格式PDF

  • 申请/专利权人 LSI CORPORATION;

    申请/专利号US201213680497

  • 发明设计人 JONATHAN DYKHUIS;MING JIN;SCOTT M. DZIAK;

    申请日2012-11-19

  • 分类号G11B27/36;

  • 国家 US

  • 入库时间 2022-08-21 16:08:45

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