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PIXEL STRUCTURE, METHOD OF MANUFACTURING PIXEL STRUCTURE, AND ACTIVE DEVICE MATRIX SUBSTRATE

机译:像素结构,制造像素结构的方法以及有源设备矩阵基体

摘要

A pixel structure, a method of manufacturing the pixel structure, and an active device matrix substrate are provided. The pixel structure includes a first patterned metal layer having a common line and a gate; a first insulation layer; a semiconductor pattern; a second patterned metal layer having a source and a drain both electrically connected to the semiconductor pattern; a second insulation layer having a contact opening exposing the drain; and an electrode layer having a common electrode, and a pixel electrode connected to the drain through the contact opening. The common line, the first insulation layer, and the pixel electrode constitute a first storage capacitor. The common line, the drain, and the common electrode constitute a sandwich structure.;The common line, the first insulation layer, and the drain constitute a second storage capacitor. The drain, the second insulation layer, and the common electrode constitute a third storage capacitor.
机译:提供了一种像素结构,制造该像素结构的方法以及有源器件矩阵基板。像素结构包括具有公共线和栅极的第一图案化金属层;以及第一绝缘层;半导体图案;第二图案化金属层具有均电连接至半导体图案的源极和漏极;第二绝缘层具有暴露出漏极的接触开口;电极层具有公共电极,像素电极通过接触开口与漏极连接。公共线,第一绝缘层和像素电极构成第一存储电容器。公共线,漏极和公共电极构成三明治结构。公共线,第一绝缘层和漏极构成第二存储电容器。漏极,第二绝缘层和公共电极构成第三存储电容器。

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