首页> 外国专利> Thermal nanoimprint lithography mould, process for producing it, and thermal nanoimprint process employing it

Thermal nanoimprint lithography mould, process for producing it, and thermal nanoimprint process employing it

机译:热纳米压印光刻模具,其制造方法以及使用该模具的热纳米压印工艺

摘要

A heating mould for thermal nanoimprint lithography, a process of producing the heating mould, and a process for producing a nanostructured substrate which include the heating mould. The heating mould includes the heating mould. The heating mould includes a substrate having a first principal surface and a second principal surface, and a through-cavity extending from a first orifice in the first principal surface up to a second orifice in the second principal surface. The mould also includes a heating layer, an electrically and thermally insulating layer which covers the heating layer and, at least partially, imprint patterns, and leads for supplying an electric current to the heating layer.
机译:用于热纳米压印光刻的加热模具,该加热模具的制造方法以及包括该加热模具的纳米结构基板的制造方法。加热模具包括加热模具。加热模具包括具有第一主表面和第二主表面的基板以及从第一主表面中的第一孔口一直延伸到第二主表面中的第二孔口的通孔。模具还包括加热层,覆盖加热层以及至少部分地压印图案的电绝缘层和用于向加热层供应电流的引线。

著录项

  • 公开/公告号US8864489B2

    专利类型

  • 公开/公告日2014-10-21

    原文格式PDF

  • 申请/专利权人 STEFAN LANDIS;SERGIO NICOLETTI;

    申请/专利号US20100880632

  • 发明设计人 STEFAN LANDIS;SERGIO NICOLETTI;

    申请日2010-09-13

  • 分类号B29C35/02;G03F7;B82Y10;B82Y40;

  • 国家 US

  • 入库时间 2022-08-21 16:05:24

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