首页>
外国专利>
Method for fabrication of an integrated circuit in a technology reduced with respect to a native technology, and corresponding integrated circuit
Method for fabrication of an integrated circuit in a technology reduced with respect to a native technology, and corresponding integrated circuit
展开▼
机译:以相对于本机技术简化的技术制造集成电路的方法和相应的集成电路
展开▼
页面导航
摘要
著录项
相似文献
摘要
The technological fabrication of the integrated circuit includes a fabrication of the integrated circuit in a reduced technological version of a native technology including at least a first dimensional compensation applied to the reduced channel length and to the reduced channel width of each transistor originating from a transistor, referred to as a “minimum transistor”, designed in the native technology and having in this native technology an initial channel length equal to a minimum length for the native technology and an initial channel width equal to a minimum width for the native technology. The fabrication obtains a transistor having a channel length equal, to a given precision, to the initial channel length and a channel width equal, to a given precision, to the initial channel width.
展开▼