The present invention relates to a microplasma current switch enabling to increase the amount of electric current passing through the microplasma current switch by adjusting the areas of electrodes exposed to plasmas. The present invention includes a plasma discharge space; a plasma generating means installed within the plasma discharge space; an exposed cathode electrode installed within the plasma discharge space; and an exposed anode electrode installed within the plasma discharge space apart from the exposed cathode electrode, wherein the exposed anode electrode is connected electrically to the exposed cathode electrode by generating a plasma, and the exposed area of the exposed anode electrode to the plasma is smaller than that of the exposed cathode electrode.
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