首页> 外国专利> Methods of forming structures having nanotubes extending between opposing electrodes and structures including same

Methods of forming structures having nanotubes extending between opposing electrodes and structures including same

机译:形成具有在相对电极之间延伸的纳米管的结构的方法以及包括该结构的方法

摘要

A semiconductor structure including nanotubes forming an electrical connection between electrodes is disclosed. The semiconductor structure may include an open volume defined by a lower surface of an electrically insulative material and sidewalls of at least a portion of each of a dielectric material and opposing electrodes. The nanotubes may extend between the opposing electrodes, forming a physical and electrical connection therebetween. The nanotubes may be encapsulated within the open volume in the semiconductor structure. A semiconductor structure including nanotubes forming an electrical connection between source and drain regions is also disclosed. The semiconductor structure may include at least one semiconducting carbon nanotube electrically connected to a source and a drain, a dielectric material disposed over the at least one semiconducting carbon nanotube and a gate dielectric overlying a portion of the dielectric material. Methods of forming the semiconductor structures are also disclosed.
机译:公开了一种半导体结构,其包括在电极之间形成电连接的纳米管。半导体结构可以包括由电绝缘材料的下表面和电介质材料中的每一个的至少一部分的侧壁以及相对的电极限定的开放体积。纳米管可以在相对电极之间延伸,从而在它们之间形成物理和电连接。纳米管可以被封装在半导体结构的开放体积内。还公开了一种半导体结构,其包括在源极和漏极区域之间形成电连接的纳米管。该半导体结构可以包括电连接至源极和漏极的至少一个半导体碳纳米管,设置在该至少一个半导体碳纳米管上方的介电材料以及覆盖该介电材料的一部分的栅极电介质。还公开了形成半导体结构的方法。

著录项

  • 公开/公告号US8748870B2

    专利类型

  • 公开/公告日2014-06-10

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201314090770

  • 发明设计人 GURTEJ S. SANDHU;EUGENE P. MARSH;

    申请日2013-11-26

  • 分类号H01L51/05;H01L51/00;

  • 国家 US

  • 入库时间 2022-08-21 16:00:14

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