AN APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS

摘要

AN APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS THE INVENTION RELATES TO AN APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS. THE APPARATUS COMPRISES A MAINLY CYLINDRICAL RESONATOR BEING PROVIDED WITH AN OUTER CYLINDRICAL WALL ENCLOSING A RESONANT CAVITY HAVING A SUBSTANTIALLY ROTATIONAL SYMMETRIC SHAPE WITH RESPECT TO A CYLINDRICAL AXIS. THE RESONATOR FURTHER INCLUDES SIDE WALL PORTIONS BOUNDING THE RESONANT CAVITY IN OPPOSITE CYLINDRICAL AXIS DIRECTIONS. IN ADDITION  THE APPARATUS COMPRISES A MICROWAVE GUIDE EXTENDING THROUGH THE OUTER CYLINDRICAL WALL INTO THE RESONANT CAVITY. THE LENGTH OF THE RESONANT CAVITY IN THE CYLINDRICAL DIRECTION VARIES AS A FUNCTION OF THE RADIAL DISTANCE TO THE CYLINDRICAL AXIS.