USE OF SURFACTANTS HAVING AT LEAST THREE SHORT CHAIN PERFLUORINATED GROUPS FOR MANUFACTURING INTEGRATED CIRCUITS HAVING PATTERNS WITH LINE SPACE DIMENSIONS BELOW 50NM

摘要

The use of surfactants A the 1% by weight aqueous solutions of which exhibit a static surface tension 25 mN/m the said surfactants A containing at least three short chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl pentafluoroethyl 1 heptafluoropropyl 2 heptafluoropropyl heptafluoroisopropyl and pentafluorosulfanyl; for manufacturing integrated circuits comprisingpatternshaving line space dimensions below 50 nm and aspect ratios 3; and a photolithographic process making use of the surfactants A in immersion photoresist layers photoresist layers exposed to actinic radiation developer solutions for the exposed photoresist layers and/or in chemical rinse solutions for developed patterned photoresistscomprisingpatterns having line space dimensions below 50 nm and aspect ratios 3.By way of the surfactants A pattern collapse is prevented line edge roughness is reduced watermark defects are prevented and removed and defects are reduced by removing particles.