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Antistatic agent, antistatic film and articles coated with antistatic film

机译:抗静电剂,抗静电膜和涂有抗静电膜的物品

摘要

The object of the invention is to provide an antistatic agent exhibiting an excellent property of preventing film-thinning phenomenon and fogging in chemically amplified resists, an antistatic film using the antistatic agent and a product coated therewith.;The antistatic agent comprising the water-soluble electroconductive polymer, the solvent and the water-soluble polymer. By using a water-soluble polymer, especially a water-soluble polymer compound having a polypeptide bond or a specific water-soluble polymer compound having a polyvinyl structure in combination with a water-soluble electroconductive polymer in an antistatic agent, influences on resist (such as fogging, film-thinning phenomenons and dissolution of resist after developing of resist) can be suppressed even when surfactant is added into the antistatic agent for the purpose of imparting coatability inexpensively and easily, while maintaining coatability of the agent. An antistatic agent having improved coatability by comprising surfactant may cause mixing, which leads to development defects and changes in the developing time, not only in chemically amplified resist but also in non-chemically amplified resist used for microfabrication.
机译:本发明的目的是提供一种在化学放大抗蚀剂中显示出优异的防止膜变薄现象和起雾的性能的抗静电剂,使用该抗静电剂的抗静电膜和用其涂覆的产品。导电聚合物,溶剂和水溶性聚合物。通过将水溶性聚合物,特别是具有多肽键的水溶性聚合物化合物或具有聚乙烯基结构的特定水溶性聚合物化合物与抗静电剂中的水溶性导电聚合物组合使用,会对抗蚀剂产生影响(例如由于起雾,即使以低廉且容易地赋予涂布性,同时维持试剂的涂布性为目的,即使在抗静电剂中添加表面活性剂,也可以抑制膜的稀薄现象和抗蚀剂显影后的抗蚀剂溶解。通过包含表面活性剂而具有改善的可涂布性的抗静电剂可能引起混合,这不仅导致在用于微细加工的化学放大的抗蚀剂中而且在非化学放大的抗蚀剂中导致显影缺陷和显影时间的变化。

著录项

  • 公开/公告号EP1818369B1

    专利类型

  • 公开/公告日2014-04-02

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO K.K.;

    申请/专利号EP20070000612

  • 发明设计人 NISHIOKA AYAKO;OHKUBO TAKASHI;

    申请日2007-01-12

  • 分类号C08L101/12;C08L65/00;C08L79/00;H01L51/00;H01B1/20;H01B1/12;

  • 国家 EP

  • 入库时间 2022-08-21 15:51:45

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