HYDROPHOBIZATION TREATMENT DEVICE, HYDROPHOBIZATION TREATMENT METHOD, AND HYDROPHOBIZATION-TREATMENT RECORDING MEDIUM

摘要

This hydrophobization treatment device (U5) is equipped with a cooling unit (40), a photoirradiation unit (50), an air supply unit (60), a raising/lowering unit (80), and a control unit (90). The cooling plate (41) of the cooling unit (40) faces the rear surface (Wb) of a wafer (W). The light source (51a) of the photoirradiation unit (50) faces the front surface (Wa) of the wafer (W) with a gap interposed therebetween, and emits light for radiation heating. The gas-storing body (61) of the air supply unit (60) covers the underside of the light source (51a) and faces the front surface (Wa) of the wafer (W) with a gap interposed therebetween. The underside of the gas-storing body (61) is provided with a plurality of gas discharge ports (63). The control unit (90) delivers a hydrophobization-treatment gas by controlling the air supply unit (60), with the wafer (W) positioned near the cooling plate (41) as a result of controlling the raising/lowering unit (80). Thereafter, the hydrophobization-treatment gas is delivered by controlling the air supply unit (60), while light is emitted from the light source (51a) by controlling the photoirradiation unit (50), and with the wafer (W) positioned near the light source as a result of controlling the raising/lowering unit (80).