NIOBIUM OXIDE SPUTTERING TARGET, PRODUCTION METHOD THEREFOR, AND NIOBIUM OXIDE FILM

摘要

The present invention provides a niobium oxide sputtering target that enables direct current (DC) sputtering, and a production method. This niobium oxide sputtering target is characterized by being a niobium oxide sintered body and in that the specific resistance thereof is 0.001-0.05 Ω⋅cm over the entire area of the sintered body in the thickness direction.