首页> 外国专利> POLYDIALKYLSILOXANE COATING LAYER HAVING IMPROVED ANTI-FINGERPRINTING AND CONCEALMENT OF FINGERPRINTING AND PREPARATION METHOD OF THE SAME

POLYDIALKYLSILOXANE COATING LAYER HAVING IMPROVED ANTI-FINGERPRINTING AND CONCEALMENT OF FINGERPRINTING AND PREPARATION METHOD OF THE SAME

机译:具有改进的抗指纹的聚二烷基硅氧烷涂料层和指纹的隐蔽性及其制备方法

摘要

The present invention relates to: a polydialkylsiloxane coating layer including an uneven pattern with more than two concavo-convex structures in a line width of the 1-10 um and a height of 1-30 um, and having the deviation rate for the area average of a closed curved line which is defined by the uneven pattern greater than 2% or the rate of a line width and a line interval of the uneven pattern is less than 1:50; and a production method of the polydialkylsiloxane coating layer. [Reference numerals] (AA) Applied fingerprint trace;(BB) Shortly after applying the finger print;(CC) After five minutes
机译:本发明涉及一种聚二烷基硅氧烷涂层,其包括具有多于两个的凹凸结构的凹凸图案,所述凹凸结构的线宽为1-10μm,高度为1-30μm,并且具有面积平均值的偏离率。由不规则图案限定的闭合曲线的大于2%或不规则图案的线宽和线间隔的比率小于1:50;聚二烷基硅氧烷涂层的制造方法。 [附图标记](AA)施加指纹迹线;(BB)施加指纹后不久;(CC)五分钟后

著录项

  • 公开/公告号KR20130125654A

    专利类型

  • 公开/公告日2013-11-19

    原文格式PDF

  • 申请/专利权人 LG CHEM. LTD.;

    申请/专利号KR20120049344

  • 发明设计人 LEE SOON YEOL;CHOI HYEON;

    申请日2012-05-09

  • 分类号C09D183/02;C09D5;C08J5/18;C09D5/28;

  • 国家 KR

  • 入库时间 2022-08-21 15:45:03

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