首页> 外国专利> BORON-DOPED REDUCTION GRAPHINE OF ADJUSTING PHYSICAL PROPERTIES OF SEMICONDUCTOR AND ELECTRIC CONDUCTIVITY, AND PREPARATION THEREOF

BORON-DOPED REDUCTION GRAPHINE OF ADJUSTING PHYSICAL PROPERTIES OF SEMICONDUCTOR AND ELECTRIC CONDUCTIVITY, AND PREPARATION THEREOF

机译:调节半导体物理性质和电导率的掺硼还原石墨烯及其制备

摘要

The present invention relates to the reduced graphene of boron be adjustable physical characteristic semiconductor and conductivity and its manufacturing method and, it is preferable that a kind of bulk method. Boron doping graphene reduction according to the present invention shows excellent electric conductivity and improved stability and is usefully used for graphene semiconductor since the reduced graphene of boron shows p-type characteristic. Reduced graphene environmental protection according to the present invention is manufactured, technique is simplified, reduces production cost, convenient for large-scale production, and adjust the semiconductor and conductivity of physical property, to be efficiently used for manufacture graphene semiconductor. ;The 2014 of copyright KIPO submissions;[Reference numerals] (AA) manufactures the graphene oxide and boron oxide of dispersion; (BB) solid mixture of graphene oxide boron oxide compound is manufactured; (CC) reduction and doping pass through heat treatment; (DD) Washing and residual boron oxide has been dried
机译:本发明涉及硼的可还原石墨烯,可调节的物理特性的半导体和导电性及其制造方法,优选一种本体法。根据本发明的硼掺杂石墨烯还原显示出优异的导电性和改善的稳定性,并且由于硼的还原石墨烯显示出p型特性,因此可用于石墨烯半导体。制造根据本发明的降低的石墨烯环境保护,简化工艺,降低生产成本,便于大规模生产,并调节半导体和物理性质的导电性,以有效地用于制造石墨烯半导体。 ; 2014年版权KIPO提交文件; [参考数字](AA)生产分散体的氧化石墨烯和氧化硼; (BB)制造氧化石墨烯氧化硼化合物的固体混合物; (CC)还原和掺杂通过热处理; (DD)洗涤和残留的氧化硼已干燥

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号