首页> 外国专利> AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

机译:化学机械抛光的水分散体,化学机械抛光方法,化学机械抛光的工具包和制备化学机械抛光的水分散体的工具

摘要

chemical mechanical polishing aqueous dispersion is abrasive grains of the component (A) and , quinolinecarboxylic acid and pyridine and one or more component (B) of the carboxylic acid , quinoline carboxylic acid and pyridine carboxylic acid and the component (C) other than the acid , oxidizing the component (D) and a third non-ionic surfactant component having a combination of (E) includes , and the mass ratio (WB / WC) is two or more of the compounding amount is less than 0.01 (WC) of the amount (WB) and the component (C) of the component (B), the component (E) has the formula is represented by 1 ; & . formula 1 & ; ( in the formula, m and n are each independently an integer of 1 or more , satisfy the m + n 50)
机译:化学机械抛光水分散液是组分(A)和喹啉羧酸和吡啶以及一种或多种羧酸(喹啉羧酸和吡啶羧酸)以及除酸以外的组分(C)的磨粒。 ,氧化组分(D)和具有(E)的组合的第三非离子表面活性剂组分包括,且质量比(WB / WC)为两种或两种以上,混合量小于0.01的(WC)成分(B)的含量(WB)和成分(C)中,具有式的成分(E)用1表示。 &。 <式1> ; (式中,m和n分别独立地为1以上的整数,满足m + n 50)

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