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AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING
chemical mechanical polishing aqueous dispersion is abrasive grains of the component (A) and , quinolinecarboxylic acid and pyridine and one or more component (B) of the carboxylic acid , quinoline carboxylic acid and pyridine carboxylic acid and the component (C) other than the acid , oxidizing the component (D) and a third non-ionic surfactant component having a combination of (E) includes , and the mass ratio (WB / WC) is two or more of the compounding amount is less than 0.01 (WC) of the amount (WB) and the component (C) of the component (B), the component (E) has the formula is represented by 1 ; & . formula 1 & ; ( in the formula, m and n are each independently an integer of 1 or more , satisfy the m + n 50)
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