首页> 外国专利> OPTICAL CHARACTERISTIC MEASUREMENT PLATFORM FOR SEMICONDUCTOR NANOWIRE AND OPTICAL CHARACTERISTIC MEASUREMENT METHOD FOR SEMICONDUCTOR NANOWIRE USING SAME

OPTICAL CHARACTERISTIC MEASUREMENT PLATFORM FOR SEMICONDUCTOR NANOWIRE AND OPTICAL CHARACTERISTIC MEASUREMENT METHOD FOR SEMICONDUCTOR NANOWIRE USING SAME

机译:半导体纳米线的光学特性测量平台和采用相同方法的半导体纳米线的光学特性测量方法

摘要

The present invention relates to an optical characteristic measurement platform for a semiconductor nanowire and an optical characteristic measurement method for a semiconductor nanowire using the same. According to the present invention, an optical characteristic measurement platform for a semiconductor nanowire and an optical characteristic measurement method for a semiconductor nanowire using the same performs the optical property analysis of an accurate nanowire by using incident high density light. By this, composition, thickness, defect in the specific region of the nanowire are accurately analyzed.;COPYRIGHT KIPO 2014
机译:本发明涉及用于半导体纳米线的光学特性测量平台以及使用该平台的用于半导体纳米线的光学特性测量方法。根据本发明,用于半导体纳米线的光学特性测量平台和使用该平台的半导体纳米线的光学特性测量方法通过使用入射的高密度光来执行精确的纳米线的光学特性分析。通过这种方法,可以精确地分析纳米线特定区域的组成,厚度,缺陷。; COPYRIGHT KIPO 2014

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号