首页> 外国专利> COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING ORIGINAL PLATE FOR LASER ENGRAVING AND PRODUCTION METHOD THEREFOR, PRODUCTION METHOD FOR RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE

COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING ORIGINAL PLATE FOR LASER ENGRAVING AND PRODUCTION METHOD THEREFOR, PRODUCTION METHOD FOR RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE

机译:激光刻印用组合物,激光刻印用原始印刷版及其制造方法,减压印版的生产方法和减压印版

摘要

ink deposition and training can obtain excellent relief printing plates, for the excellent rinsing property after laser engraving laser engraving to provide a composition for the purpose. And composition (component A) acrylate oligomer for laser engraving of the present invention, (component B) and the thermal polymerization initiator (component C) and containing the formula (1) to (7), at least one of a compound represented by, (component D) does not contain a weight average molecular weight of 10,000 or more resin or higher than 0% by mass based on the total weight of the composition, and characterized in that it contains less than 2% by weight. [Equation (1) to (7) of, R 1 ~R 18 are each independently a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl or heteroaryl shows the ventilation, L 2 represents a divalent organic group, L 3 represents a trivalent organic group, L 4 is a tetravalent organic group show]
机译:油墨沉积和训练可获得出色的凸版印刷版,因为激光雕刻后的漂洗性能优异,激光雕刻后可提供用于该目的的组合物。并且,本发明的激光雕刻用组合物(A成分)丙烯酸酯低聚物,(B)成分和热聚合引发剂(C成分)含有式(1)〜(7),以下所示的化合物中的至少一种, (成分D)(重均分子量)以组合物的总重量为基准,不含有10,000以上的树脂或大于0质量%的重均分子量,特征在于小于2质量%。 〔R 1〜Sup>〜R <Sup> 18的式(1)〜(7)分别独立地为氢原子,烷基,取代烷基,芳基,取代的芳基或杂芳基表示通风,L 2 表示二价有机基团,L 3 表示三价有机基团,L 4 是a四价有机基团显示]

著录项

  • 公开/公告号KR20140043436A

    专利类型

  • 公开/公告日2014-04-09

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号KR20147001219

  • 发明设计人 YOSHIDA KENTA;

    申请日2012-07-26

  • 分类号B41N1/12;C08F2/44;

  • 国家 KR

  • 入库时间 2022-08-21 15:43:16

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