首页> 外国专利> JUNCTION SENSOR ARRAY USING METAL OXIDE SEMICONDUCTOR AND MANUFACTURING METHOD FOR JUNCTION SENSOR ARRAY

JUNCTION SENSOR ARRAY USING METAL OXIDE SEMICONDUCTOR AND MANUFACTURING METHOD FOR JUNCTION SENSOR ARRAY

机译:金属氧化物半导体的结线传感器阵列及结线传感器阵列的制造方法

摘要

Disclosed in the present invention is a junction sensor array using a metal oxide semiconductor, which comprises: a semiconductor substrate (10); and a junction sensor element (100) including a first semiconductor seed layer (20) and a second semiconductor seed layer (30) which are deposited on the semiconductor substrate (10) at regular intervals, a first nanostructure (21) and a second nanostructure (31) which grow from the first semiconductor seed layer (20) and the second semiconductor seed layer (30) respectively, and a catalyst layer (50) which is deposited on the surface of the first nanostructure (21) and the second nanostructure (31).;COPYRIGHT KIPO 2015
机译:本发明公开了一种使用金属氧化物半导体的结传感器阵列,该结传感器阵列包括:半导体基板(10);以及半导体基板(10)。结传感器元件(100),其包括以规则间隔沉积在半导体衬底(10)上的第一半导体种子层(20)和第二半导体种子层(30),第一纳米结构(21)和第二纳米结构(31)分别从第一半导体种子层(20)和第二半导体种子层(30)以及沉积在第一纳米结构(21)和第二纳米结构( 31).; COPYRIGHT KIPO 2015

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号