Sintering method of semiconductor oxide by using intense pulsed light

摘要

The present invention relates to a method of a semiconductor optical sintered oxide using extreme wave white light irradiation , 1) semiconductor oxide nanoparticles step of particle paste or a semiconductor oxide precursor coating on the substrate drying ; And 2 ) a step of sintering is irradiated with white light at room temperature extreme wave conditions and the semiconductor oxide nanoparticles or semiconductor oxide precursor coated substrate , thereby manufacturing an optical semiconductor oxide sintered at a low cost in a short period of time at room conditions can be , and semiconductor oxides prepared using extreme wave white light irradiation method may be useful in electronic devices such as solar cells or energy . ;