ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

antenna that can improve throughput in-plane uniformity of the substrate surface , the dielectric window , the plasma processing apparatus and plasma processing provides a method . The antenna is provided with a slot plate 20 is installed on one surface of the dielectric window 16, a dielectric window (16) . Tabangmyeon of the dielectric window 16, a flat surface surrounded by an annular first recess 146 and , so as to surround the center of the flat face 146, a plurality of the second formed in the flat surface 146, the recess (153 ) has . When viewed from the direction perpendicular to the main surface of the slot plate , and in each of the slots 133 in the slot plate 20 is located in the center position of each of the second concave portion 153 is nested .