Photoacid generator bound positive polymer resist and the method of preparing the same

摘要

PURPOSE: A positive type polymer resist including a photoacid generator and a manufacturing method of the same are provided to ensure the ultrafine line-width of high resolution and to develop the polymer resist under a commercialized solution such as tetramethyl ammonium hydroxide. CONSTITUTION: A positive type polymer resist includes repeating units represented by a chemical formula 1 or 2. In chemical formulas 1 and 2, R1 and R2 are selected from a group including hydrogen atom, C1-20 alkyl group or C1-20 cycloalkyl group, ditetrabutyl dicarbonate styrene carbonate, and lactone group; the sum of a, b, and c is 1; and the sum of l, m, and n is 1. The weight average molecular weight of a repeating unit represented by chemical formula 1 is in a range between 3,000 and 100,000, inclusively. The weight average molecular weight of a repeating unit represented by chemical formula 2 is in a range between 10,000 and 100,000, inclusively.