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Method to fabricate asymmetric long-period fiber grating and optical fiber based sensor to fabricate by using the method
Method to fabricate asymmetric long-period fiber grating and optical fiber based sensor to fabricate by using the method
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机译:一种不对称长周期光纤光栅的制造方法及基于该方法的光纤传感器
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摘要
An embodiment of the present invention relates to an asymmetrical long-period lattice manufacturing method of an optical fiber, and the asymmetrical long-period lattice manufacturing method comprises a polymer forming step for forming a polymer by coating a second polymer and by loading the optical fiber on a first polymer after coating the first polymer on a circuit board; a light exposing step for exposing light to the second polymer by exposing ultraviolet ray through a mask after arranging the mask including an opened part and a blocked part on the circuit board; and an etching step for forming the asymmetrical long-period lattice on the optical fiber by etching the surface of the optical fiber exposed through the phenomenon of the second polymer. The second polymer has a bigger reactivity than the first polymer, and the asymmetrical long-period lattice is able to be formed on the optical fiber with the second polymer in the developing step. According to the embodiment of the present invention, the asymmetrical long-period lattice manufacturing method is able to form the asymmetrical long-period lattice based on the etching process of a semiconductor process without an expensive equipment such as a photosensitive optical fiber or an ultraviolet laser used in the existing amplitude mask method and an arc discharging method. Therefore, the asymmetrical long-period lattice manufacturing method is able to reduce costs and be mass produced. [Reference numerals] (AA) Start;(BB) End;(S100) Step of forming polymer;(S110) Coating first polymer on circuit board;(S120) Baking an optical fiber after loading the optical fiber on a first polymer;(S130) Baking an optical fiber after coating the optical fiber on a second polymer;(S200) Step of exposing ultraviolet rays to a polymer coated on a circuit board;(S210) Exposing ultraviolet rays to a circuit board through a mask which is partially opened;(S220) Baking exposed circuit board;(S300) Step of developing a part of a second polymer which is exposed by ultraviolet rays;(S400) Step of etching and forming asymmetrical long-period lattice by etching an optical fiber in which a second polymer is removed
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