首页> 外国专利> Method to fabricate asymmetric long-period fiber grating and optical fiber based sensor to fabricate by using the method

Method to fabricate asymmetric long-period fiber grating and optical fiber based sensor to fabricate by using the method

机译:一种不对称长周期光纤光栅的制造方法及基于该方法的光纤传感器

摘要

An embodiment of the present invention relates to an asymmetrical long-period lattice manufacturing method of an optical fiber, and the asymmetrical long-period lattice manufacturing method comprises a polymer forming step for forming a polymer by coating a second polymer and by loading the optical fiber on a first polymer after coating the first polymer on a circuit board; a light exposing step for exposing light to the second polymer by exposing ultraviolet ray through a mask after arranging the mask including an opened part and a blocked part on the circuit board; and an etching step for forming the asymmetrical long-period lattice on the optical fiber by etching the surface of the optical fiber exposed through the phenomenon of the second polymer. The second polymer has a bigger reactivity than the first polymer, and the asymmetrical long-period lattice is able to be formed on the optical fiber with the second polymer in the developing step. According to the embodiment of the present invention, the asymmetrical long-period lattice manufacturing method is able to form the asymmetrical long-period lattice based on the etching process of a semiconductor process without an expensive equipment such as a photosensitive optical fiber or an ultraviolet laser used in the existing amplitude mask method and an arc discharging method. Therefore, the asymmetrical long-period lattice manufacturing method is able to reduce costs and be mass produced. [Reference numerals] (AA) Start;(BB) End;(S100) Step of forming polymer;(S110) Coating first polymer on circuit board;(S120) Baking an optical fiber after loading the optical fiber on a first polymer;(S130) Baking an optical fiber after coating the optical fiber on a second polymer;(S200) Step of exposing ultraviolet rays to a polymer coated on a circuit board;(S210) Exposing ultraviolet rays to a circuit board through a mask which is partially opened;(S220) Baking exposed circuit board;(S300) Step of developing a part of a second polymer which is exposed by ultraviolet rays;(S400) Step of etching and forming asymmetrical long-period lattice by etching an optical fiber in which a second polymer is removed
机译:本发明的一个实施方式涉及一种光纤的不对称长周期晶格制造方法,并且该不对称长周期晶格制造方法包括聚合物形成步骤,该聚合物形成步骤用于通过涂覆第二聚合物并通过装载光纤来形成聚合物。在将第一聚合物涂覆在电路板上之后,在第一聚合物上;曝光步骤,在将包括开口部分和阻挡部分的掩模布置在电路板上之后,通过使紫外线通过掩模曝光而将光曝光到第二聚合物。刻蚀步骤,通过刻蚀因第二聚合物现象而暴露的光纤表面,在光纤上形成不对称的长周期晶格。第二聚合物具有比第一聚合物更大的反应性,并且在显影步骤中能够与第二聚合物在光纤上形成不对称的长周期晶格。根据本发明的实施例,不对称长周期晶格的制造方法能够基于半导体工艺的蚀刻工艺来形成不对称长周期晶格,而无需昂贵的设备,例如光敏光纤或紫外线激光器。在现有的振幅掩膜法和电弧放电法中使用。因此,非对称长周期晶格制造方法能够降低成本并批量生产。 [附图标记](AA)开始;(BB)结束;(S100)形成聚合物的步骤;(S110)在电路板上涂覆第一聚合物;(S120)在将光纤装载到第一聚合物上之后烘烤光纤; S130)将光纤涂覆在第二聚合物上之后烘烤光纤;(S200)将紫外线暴露于涂覆在电路板上的聚合物上的步骤;(S210)通过部分打开的掩模将紫外线暴露于电路板上;(S220)烘烤暴露的电路板;(S300)显影一部分被紫外线照射的第二聚合物的步骤;(S400)通过刻蚀光纤而刻蚀并形成不对称的长周期晶格的步骤,其中第二聚合物被去除

著录项

  • 公开/公告号KR101394755B1

    专利类型

  • 公开/公告日2014-05-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20120057207

  • 发明设计人 한영근;강철주;권오장;

    申请日2012-05-30

  • 分类号G02B6/13;G02B6/028;

  • 国家 KR

  • 入库时间 2022-08-21 15:40:56

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