首页> 外国专利> Atmospheric pressure plasma generating device and atmospheric pressure plasma device for treating the surface having the same

Atmospheric pressure plasma generating device and atmospheric pressure plasma device for treating the surface having the same

机译:大气压等离子体产生装置和用于处理具有该表面的气压等离子体装置

摘要

PURPOSE: An atmospheric pressure plasma generating apparatus and an atmospheric pressure plasma surface treatment apparatus comprising the same are provided to perform stable and uniform plasma surface treatment, by injecting a plasma gas between a first injection hole and a second injection hole through a number of injection through-holes. CONSTITUTION: A power source electrode(110) has a bottom of flat semicircular shape or elliptic profile shape. A first ground electrode(120) generates plasma in a space separated from the power source electrode by reacting to the power supply electrode. A second ground electrode(130) generates plasma in a space separated from the power source electrode by reacting to the power source electrode. A gas feed port(140) supplies a reaction gas to a space separated between the power source electrode and the second ground electrode. A first injection hole(151) is located in one end of the power source electrode. A second injection hole(152) is located in the other end of the power source electrode.
机译:目的:提供一种常压等离子体产生装置和包括该常压等离子体产生装置的常压等离子体表面处理装置,以通过多次注入在第一注入孔和第二注入孔之间注入等离子体气体来进行稳定且均匀的等离子体表面处理。通孔。构成:电源电极(110)的底部为半圆形或椭圆形。第一接地电极(120)通过与电源电极反应而在与电源电极分离的空间中产生等离子体。第二接地电极(130)通过与电源电极反应而在与电源电极分离的空间中产生等离子体。气体供给口(140)将反应气体供给至在电源电极与第二接地电极之间隔开的空间。第一注入孔(151)位于电源电极的一端。第二注入孔(152)位于电源电极的另一端。

著录项

  • 公开/公告号KR101427091B1

    专利类型

  • 公开/公告日2014-08-07

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20080051597

  • 发明设计人 신인철;강승익;

    申请日2008-06-02

  • 分类号H01L21/3065;

  • 国家 KR

  • 入库时间 2022-08-21 15:40:19

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