首页> 外国专利> HOMOGENEOUS, DUAL LAYER, SOLID STATE, THIN FILM DEPOSITION FOR STRUCTURAL AND/OR ELECTROCHEMICAL CHARACTERISTICS

HOMOGENEOUS, DUAL LAYER, SOLID STATE, THIN FILM DEPOSITION FOR STRUCTURAL AND/OR ELECTROCHEMICAL CHARACTERISTICS

机译:均质,双层,固态,薄膜沉积,用于结构和/或电化学特性

摘要

Solid state, thin film, electrochemical devices (10) and methods of making the same are disclosed. An exemplary device 10 includes at least one electrode (14) and an electrolyte (16) deposited on the electrode (14). The electrolyte (16) includes at least two homogenous layers of discrete physical properties. The two homogenous layers comprise a first dense layer (15) and a second porous layer (16).
机译:公开了固态,薄膜,电化学装置(10)及其制造方法。示例性装置10包括至少一个电极(14)和沉积在电极(14)上的电解质(16)。电解质(16)包括至少两个均匀的,物理性质离散的层。这两个均质层包括第一致密层(15)和第二多孔层(16)。

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