首页> 外国专利> APPARATUS OF SIMULATING TREATMENT LINE LAYOUT OF MASK CLEANING SYSTEM

APPARATUS OF SIMULATING TREATMENT LINE LAYOUT OF MASK CLEANING SYSTEM

机译:面膜清洗系统的模拟处理线布局的装置

摘要

The present invention relates to a method to simulate a layout of a mask processing system, and a mask processing system using the same. An apparatus to simulate a layout of a mask processing system including a treatment line having a plurality of treatment baths disposed in series, two or more mobile robots grasping a mask coupled to a jig and sequentially treating the mask in the treatment baths while moving along the treatment line, and a temporary repository temporarily accumulating a jig between the treatment baths disposed in the treatment line comprises: an input unit inputting one or more among information of a treatment zone of the treatment line, information of the mobile robot, and recipe information of the treatment baths; and a calculation unit dividing the treatment line into a plurality of treatment zones such that variations of a section process time required in each treatment zone are minimized on the basis of a time for which the mask, which goes through the treatment baths one by one, is treated in each treatment bath in the treatment line in accordance to an input data inputted through the input unit, and disposing the mobile robot controlled in movement in each treatment zone to thus dispose the treatment line. The apparatus to simulate a layout of a mask processing system can perform various treatment processes on various masks using a single mask processing system, and minimize a standby time for each mask to wait during a process of being treated, while passing through the treatment baths, to thus obtain a layout for highly efficient mask treatment process.
机译:模拟掩模处理系统的布局的方法和使用该方法的掩模处理系统技术领域本发明涉及一种模拟掩模处理系统的布局的方法和使用该方法的掩模处理系统。一种用于模拟掩模处理系统的布局的设备,该设备包括:具有串联布置的多个处理槽的处理线;两个或更多个移动机器人抓握与夹具连接的掩模,并在沿着处理槽移动的同时依次在处理槽中处理掩模处理线,以及在该处理线内的处理槽之间临时积存夹具的临时仓库,其包括:输入单元,其输入处理线的处理区域的信息,移动机器人的信息,以及配方的信息中的一个或多个。治疗浴;计算单元将处理线划分为多个处理区域,从而基于通过处理槽的掩模一次通过的时间,将各处理区域中所需的截面处理时间的偏差最小化,根据通过输入单元输入的输入数据,在处理线中的每个处理槽中对被处理物进行处理,并且将在移动中受到控制的移动机器人布置在每个处理区中,从而布置处理线。模拟掩模处理系统的布局的设备可以使用单个掩模处理系统在各种掩模上执行各种处理过程,并且在经过处理槽的同时,使每个掩模在被处理过程中等待的待机时间最小化,从而获得用于高效掩模处理工艺的布局。

著录项

  • 公开/公告号KR101456615B1

    专利类型

  • 公开/公告日2014-11-03

    原文格式PDF

  • 申请/专利权人 K.C.TECH CO. LTD.;

    申请/专利号KR20130045831

  • 发明设计人 BAEK UN YOUNG;

    申请日2013-04-25

  • 分类号H01L51/56;H05B33/10;

  • 国家 KR

  • 入库时间 2022-08-21 15:39:48

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