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TESTING STIFFNESS BASED ON ACOUSTIC EMISSION FOR PDC, PCBN or other hard or superhard materials

机译:基于声发射的PDC,PCBN或其他硬质或超硬材料的测试刚度

摘要

1. Testing apparatus based on the acoustic emission, comprising: a pressure chamber having a first chamber and a second chamber, the first chamber is adapted to increase the pressure to the first pressure and the second chamber is adapted to increase the pressure to a second pressure; rock sample, placed in the pressure chamber, wherein the rock sample comprises a first portion and a second portion, the first portion is exposed to the first pressure and the second portion is exposed to a second pressure; iodine or more acoustic sensors coupled with a sample of the rock to transmit signals, wherein the second pressure is increased to a threshold pressure at a rate of pressure increase, the second pressure is maintained at the threshold pressure level for a time period, and the second pressure is reduced with a pressure reduction rate, aakusticheskie sensors define one or more acoustic events occurring in the sample porody.2 mountain. Testing apparatus based on acoustic emission according to claim 1, wherein the first pressure is maintained at a level substantially mountain porody.3 confining pressure. Testing apparatus based on acoustic emission according to claim 1, wherein the acoustic sensor is connected with the sample porody.4 mountain. Testing apparatus based on the acoustic emission according to claim 1, further comprising a first fluid and a second fluid, wherein the first fluid is placed in the first chamber and the second fluid is placed into the second chamber, wherein at least a portion of the second fluid
机译:1。一种基于声发射的测试装置,包括:具有第一室和第二室的压力室,所述第一室适于将压力增加至第一压力,并且所述第二室适于将压力增加至第二压力。压力;岩石样品,放置在压力室中,其中岩石样品包括第一部分和第二部分,第一部分暴露于第一压力,第二部分暴露于第二压力;碘或更多的声音传感器与岩石样品耦合以传输信号,其中第二压力以压力增加的速率增加到阈值压力,第二压力在一段时间内保持在阈值压力水平,并且第二压力随压力降低率而降低,aakusticheskie传感器定义了在样品孔2中发生的一个或多个声音事件。 2.根据权利要求1所述的基于声发射的测试装置,其特征在于,所述第一压力被维持在基本山形孔隙3的水平。 2.根据权利要求1所述的基于声发射的测试设备,其中,所述声传感器与所述样品孔4连接。 2.根据权利要求1所述的基于声发射的测试设备,还包括第一流体和第二流体,其中,所述第一流体被放置在所述第一腔室中,并且所述第二流体被放置在所述第二腔室中,其中,第二流体

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