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SYSTEM OF MEASUREMENT OF REFRACTION INDEX AND CHANGES OF TWO REFRACTION, PRODUCED BY NONLINEAR EFFECT IN OPTICAL MATERIAL MICROZONES
SYSTEM OF MEASUREMENT OF REFRACTION INDEX AND CHANGES OF TWO REFRACTION, PRODUCED BY NONLINEAR EFFECT IN OPTICAL MATERIAL MICROZONES
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机译:光学材料微区中非线性效应产生的折射率测量和两次折射率变化的系统
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摘要
1. A system for measuring changes in refractive index and birefringence caused by nonlinear effects, consisting of a femtosecond laser, a photon optical fiber, an optical system including a beam splitter, two optical channels and an interferometric system, in particular, in the form of a VAWI interferometer located in the optical axis of the measuring beam emerging from the optical system, characterized in that the first optical channel (KO1) includes a monochromator (MCR) with a capacitor (K) forming a beam and measurements, and a monochromator (MCR) at the input is connected to a photonic optical fiber (SF), and the second optical channel (KO2) contains a mirror system including a moving mirror (ZP), which changes the optical path length of the second beam in the second optical channel ( KO2), while the test material (M) is placed in the measurement area located at the intersection of the measurement beam and the second beam transmitted through the optical channel (KO2) .2. The system of claim 1, wherein the optical filter (F) that cuts off the second laser beam is placed between the test material (M) and the VAWI interferometer. The system according to claim 1, in which the first optical channel (KO1) includes a focusing element, in particular in the form of a first lens (Ob1) placed on the input surface of the end face of the photonic optical fiber (SF). The system according to claim 1, in which the second optical channel (KO2) includes a second optical fiber (SM) equipped with an optical focusing element on the input surface of the end face, in particular in the form of a second lens (Ob2). The system of claim 1, wherein the moving mirror system (ZP) includes a second green
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