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SYSTEM OF MEASUREMENT OF REFRACTION INDEX AND CHANGES OF TWO REFRACTION, PRODUCED BY NONLINEAR EFFECT IN OPTICAL MATERIAL MICROZONES

机译:光学材料微区中非线性效应产生的折射率测量和两次折射率变化的系统

摘要

1. A system for measuring changes in refractive index and birefringence caused by nonlinear effects, consisting of a femtosecond laser, a photon optical fiber, an optical system including a beam splitter, two optical channels and an interferometric system, in particular, in the form of a VAWI interferometer located in the optical axis of the measuring beam emerging from the optical system, characterized in that the first optical channel (KO1) includes a monochromator (MCR) with a capacitor (K) forming a beam and measurements, and a monochromator (MCR) at the input is connected to a photonic optical fiber (SF), and the second optical channel (KO2) contains a mirror system including a moving mirror (ZP), which changes the optical path length of the second beam in the second optical channel ( KO2), while the test material (M) is placed in the measurement area located at the intersection of the measurement beam and the second beam transmitted through the optical channel (KO2) .2. The system of claim 1, wherein the optical filter (F) that cuts off the second laser beam is placed between the test material (M) and the VAWI interferometer. The system according to claim 1, in which the first optical channel (KO1) includes a focusing element, in particular in the form of a first lens (Ob1) placed on the input surface of the end face of the photonic optical fiber (SF). The system according to claim 1, in which the second optical channel (KO2) includes a second optical fiber (SM) equipped with an optical focusing element on the input surface of the end face, in particular in the form of a second lens (Ob2). The system of claim 1, wherein the moving mirror system (ZP) includes a second green
机译:1.一种用于测量由非线性效应引起的折射率和双折射的变化的系统,其由飞秒激光器,光子光纤,包括分束器的光学系统,两个光学通道和干涉测量系统组成,特别是采用以下形式VAWI干涉仪位于从光学系统射出的测量光束的光轴上的特征在于,第一光通道(KO1)包括一个单色仪(MCR)和一个形成光束和测量值的电容器(K),以及一个单色仪输入端(MCR)连接到光子光纤(SF),第二光通道(KO2)包含一个包含移动镜(ZP)的镜系统,该镜系统会改变第二个光束在第二个光束中的光程光学通道(KO2),而将测试材料(M)放置在位于通过光束(KO2)传输的测量光束和第二光束相交处的测量区域中。2。 2.根据权利要求1所述的系统,其中,切断所述第二激光束的所述滤光器(F)被放置在所述测试材料(M)与所述VAWI干涉仪之间。 2.根据权利要求1所述的系统,其特征在于,所述第一光通道(KO1)包括聚焦元件,特别是呈第一透镜(Ob1)形式的聚焦元件,所述聚焦元件放置在光子光纤(SF)的端面的输入表面上。 。 2.根据权利要求1所述的系统,其中,所述第二光学通道(KO2)包括第二光纤(SM),所述第二光纤在所述端面的输入表面上配备有光学聚焦元件,特别是第二透镜(Ob2)的形式。 )。 2.根据权利要求1所述的系统,其中,所述移动镜系统(ZP)包括第二绿色。

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