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Measurement system for refractive index and birefringence changes caused by nonlinear effects in optical material microareas

机译:光学材料微区中非线性效应引起的折射率和双折射变化的测量系统

摘要

The system is composed of the femtosecond laser (FS), the photonic optical fibre (SF), the optical system with the light-splitting element (DW) and two optical channels (KO1, K02) and the interferometric system, particularly in a form of the VAWI interferometer situated in the optical axis of the measurement beam emerging from the optical system. The first optical channel (KO1) includes the monochromator (MCR) with the condenser (K) forming the measurement beam and the monochromator (MCR) at the entrance is connected to the photonic optical fibre (SF). The mirror system of the second optical channel (KO2) includes the moveable mirror (ZP) which changes the optical path length of the second beam in the mentioned second optical channel (KO2). The tested material (M) is placed in the measurement area situated in the crossing of the measurement beam and the second beam delivered via the optical channel (KO2).
机译:该系统由飞秒激光器(FS),光子光纤(SF),具有分光元件(DW)和两个光学通道(KO1,K02)的光学系统以及干涉仪系统组成,尤其是以下形式: VAWI干涉仪位于位于从光学系统射出的测量光束的光轴上的角度。第一光通道(KO1)包括具有形成测量光束的聚光器(K)的单色仪(MCR),并且在入口处的单色仪(MCR)连接至光子光纤(SF)。第二光学通道(KO2)的反射镜系统包括可移动反射镜(ZP),该可移动反射镜(ZP)改变在所述第二光学通道(KO2)中第二光束的光路长度。被测材料(M)被放置在位于通过光学通道(KO2)传输的测量光束和第二光束交叉处的测量区域中。

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