DEVICE AND METHOD FOR PROCESSING gaseous media and the use of said device for processing of gaseous media, liquids, solids, surfaces, or any combination

摘要

1. Device (1) for processing a gaseous medium, comprising in the flow direction of the gaseous sredygeneriruyuschee plasma device (2) to create a plasma in a gaseous medium (21), and at least one dielectric structure (3) formed as at least one tube fused quartz, characterized in that the plasma is able to be transferred to said at least one dielectric structure (3) .2. Device (1) according to claim 1, characterized in that the gaseous medium in the direction of flow, downstream of said at least one dielectric structure (3) comprises a chamber (10) interaction, comprising an inner space (11) and at least one wall (12) .3. Device (1) according to claim 2, characterized in that said at least one wall (12) is covered at least partially diamond coating (13) .4. Device (1) according to claim 1, characterized in that no microwave radiation directed to said at least one dielectric structure (3) .5. Device (1) according to claim 2, characterized in that the chamber (10) reacting comprises at least one electrode (15) .6. Device (1) according to claim 5, characterized in that said at least one electrode (15) is partly covered with diamond coating (13) .7. Device (1) according to claim 2, characterized in that the chamber (10) comprises a multiply structure interaction (23), wherein the multiply structure (23) is covered at least partially diamond coating (13) .8. Device (1) according to claim 7, characterized in that the substantially cylindrical structure (24) is placed in the volume that covers multiply conical structure (23), wherein the cylindrical structure (24) is covered at