Centres of some strain resistance gauges included into opposite arms of the bridge measurement circuit and perceiving relative positive deformations are located at the distance from the centre of the crystal determined on the basis of the following ratio: <mrow><msub><mi>R</mi><mn>1</mn></msub><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><msub><mi>r</mi><mn>1</mn></msub><mrow><mo>(</mo><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub><mo>,</mo><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mo>)</mo></mrow><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><munderover><mo>∑</mo><mrow><mi>i</mi><mo>=</mo><mn>0</mn></mrow><mn>2</mn></munderover><msub><mi>k</mi><mi>i</mi></msub><msup><mrow><mrow><mo>(</mo><mrow><mfrac><mrow><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow></mfrac></mrow><mo>)</mo></mrow></mrow><mi>i</mi></msup><mo>.</mo></mrow> Centres of other strain resistance gauges included into opposite arms of the bridge measurement circuit and perceiving relative negative deformations are located at the distance from the centre of the crystal determined on the basis of the following ratio: <mrow><msub><mi>R</mi><mn>2</mn></msub><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><msub><mi>r</mi><mn>2</mn></msub><mrow><mo>(</mo><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub><mo>,</mo><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mo>)</mo></mrow><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><munderover><mo>∑</mo><mrow><mi>i</mi><mo>=</mo><mn>0</mn></mrow><mn>2</mn></munderover><msub><mi>l</mi><mi>i</mi></msub><msup><mrow><mrow><mo>(</mo><mrow><mfrac><mrow><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow></mfrac></mrow><mo>)</mo></mrow></mrow><mi>i</mi></msup><mo>.</mo></mrow> ;EFFECT: higher accuracy of measurement.;7 dwg"/> SENSOR OF ABSOLUTE PRESSURE OF HIGH ACCURACY BASED ON SEMICONDUCTING SENSITIVE ELEMENT WITH RIGID CENTRE
首页> 外国专利> SENSOR OF ABSOLUTE PRESSURE OF HIGH ACCURACY BASED ON SEMICONDUCTING SENSITIVE ELEMENT WITH RIGID CENTRE

SENSOR OF ABSOLUTE PRESSURE OF HIGH ACCURACY BASED ON SEMICONDUCTING SENSITIVE ELEMENT WITH RIGID CENTRE

机译:基于刚性中心的半导电敏感元件的高精度绝对压力传感器

摘要

FIELD: measurement equipment.;SUBSTANCE: sensor of absolute pressure comprises a body with a nozzle, a sealing contact block, a metal membrane, a non-compressible liquid, a semiconducting sensitive element comprising a glass base and a square profiled semiconducting crystal, in the centre of the thin part of which there is a stiff centre of square shape, on the working part of the semiconducting crystal there is a bridge measurement circuit formed of four strain resistance gauges. The size of the stiff centre is determined based on the following ratio: <mrow><msub><mi>l</mi><mrow><mi>s</mi><mo>.</mo><mi>c</mi><mo>.</mo></mrow></msub><mo></mo><mrow><mrow><msup><mrow /><mrow><msub><mi>h</mi><mrow><mi>s</mi><mo>.</mo><mi>c</mi><mo>.</mo></mrow></msub></mrow></msup></mrow><mo>/</mo><mrow><msub><mrow /><mrow><mn>1,432</mn></mrow></msub></mrow></mrow><mo>.</mo></mrow> Centres of some strain resistance gauges included into opposite arms of the bridge measurement circuit and perceiving relative positive deformations are located at the distance from the centre of the crystal determined on the basis of the following ratio: <mrow><msub><mi>R</mi><mn>1</mn></msub><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><msub><mi>r</mi><mn>1</mn></msub><mrow><mo>(</mo><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub><mo>,</mo><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mo>)</mo></mrow><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><munderover><mo>∑</mo><mrow><mi>i</mi><mo>=</mo><mn>0</mn></mrow><mn>2</mn></munderover><msub><mi>k</mi><mi>i</mi></msub><msup><mrow><mrow><mo>(</mo><mrow><mfrac><mrow><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow></mfrac></mrow><mo>)</mo></mrow></mrow><mi>i</mi></msup><mo>.</mo></mrow> Centres of other strain resistance gauges included into opposite arms of the bridge measurement circuit and perceiving relative negative deformations are located at the distance from the centre of the crystal determined on the basis of the following ratio: <mrow><msub><mi>R</mi><mn>2</mn></msub><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><msub><mi>r</mi><mn>2</mn></msub><mrow><mo>(</mo><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub><mo>,</mo><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mo>)</mo></mrow><mo>=</mo><mfrac><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow><mn>2</mn></mfrac><mo>⋅</mo><munderover><mo>∑</mo><mrow><mi>i</mi><mo>=</mo><mn>0</mn></mrow><mn>2</mn></munderover><msub><mi>l</mi><mi>i</mi></msub><msup><mrow><mrow><mo>(</mo><mrow><mfrac><mrow><msub><mi>l</mi><mrow><mi>s</mi><mi>c</mi></mrow></msub></mrow><mrow><msub><mi>L</mi><mrow><mi>t</mi><mi>p</mi></mrow></msub></mrow></mfrac></mrow><mo>)</mo></mrow></mrow><mi>i</mi></msup><mo>.</mo></mrow> ;EFFECT: higher accuracy of measurement.;7 dwg
机译:领域:绝对压力传感器包括:带有喷嘴的主体,密封接触块,金属膜,不可压缩的液体,包括玻璃基底和方形异型半导体晶体的半导体敏感元件。薄的部分的中心有一个刚性的正方形中心,在半导体晶体的工作部分上有一个由四个应变电阻计组成的电桥测量电路。刚性中心的大小基于以下比率确定: <![CDATA [ l s c < mrow/>hsc / 1,432 ]]> <图像文件=“ 00000020.GIF” he =“ 8” imgContent =“未定义” imgFormat =“ GIF” wi =“ 27” /> 某些应变电阻计的中心位于桥测量电路的相对臂中,并且可以感觉到相对正变形,该应变仪位于距晶体中心的距离处,该距离基于以下比率确定: <![CDATA [ R 1 = L t p 2 ⋅< / mo> r 1 L t p l s c = L t p 2 i = 0 2 k i < mrow> l s c < / mrow> L t p < / mrow> i ]]> <图像文件=“ 00000021.GIF” he =“ 17“ imgContent =” undefined“ imgFormat =” GIF“ wi =” 77“ /> 包含在电桥测量电路的相对臂中并能感知相对负变形的其他应变电阻测量仪的中心位于距晶体中心的距离处,该距离是根据以下比率确定的: <![CDATA [ R 2 = L t p 2 ⋅< / mo> r 2 L t p l s c = L t p 2 i = 0 2 l i < mrow> l s c < / mrow> L < / mi> t p i ]]> <图像文件=“ 00000022.GIF” he = “ 17” imgContent =“未定义” imgFormat =“ GIF” wi =“ 77” /> ;效果:更高的测量精度。; 7 dwg

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