Substrate holder for use in process chamber of semiconductor substrate treatment device, has recess having bearing surfaces which lie in common plane, and wall in region of projections in plan view of top face is straight

摘要

The substrate holder has a flat upper surface, in which recess for receiving a substrate is formed. The recess has a bottom (13) and a round closed wall with several projections (15) protruding in the recess. A support surface (19) is formed to support an edge portion of the substrate. All the support surfaces of recess lie in a common plane, and extend above the highest point of the bottom of recess and below the upper surface. The wall in the region (16) of projections in the plan view of top face is straight.