electron-beam evaporation arrangement and method for electron-beam evaporation

摘要

According to various embodiments, a electron-beam evaporation arrangement (100) is provided, comprising: a first electron beam source (102a) and is equipped for providing a first electron beam (112a); a second electron beam source (102b) and is equipped for providing a second electron beam (112b); a first reception region (106a) for receiving a first material (118a); a second receiving region (106b) for receiving a second material (118b); a first deflection configuration (104a) and is equipped for deflection of the first electron beam (112a) on the first reception region (106a); a second deflection configuration (104b) and is equipped for deflecting the second electron beam (112b) to the second receiving region (106b); and wherein the first deflection configuration (104a) and the second deflection configuration (104b) are magnetically coupled to one another.