Optical system for use in micro lithographic projection exposure system, has periodic grating structures made from material, where intensity of electromagnetic radiation in beam path amounts to maximum percentages of intensity of radiation

摘要

The system has first periodic grating structures (110) made from electrically conductive material, where intensity of electromagnetic radiation exhibits a wavelength ranging from 100 nm to 400 nm. The intensity of electromagnetic radiation in an optical used beam path in the first periodical grating structures amounts to maximum 60 percentages of intensity of radiation before impinging on the periodical grating structures. Second periodical grating structures are arranged in the periodical grating structures along light propagation direction. An independent claim is also included for a method for manufacturing micro lithographic microstructured components.