Therein by the plasma at atmospheric pressure of a hydrophobic coating has a low energy of the surface and has low thereof can be modulated

摘要

The process comprises exposing a surface of a substrate to a dielectric barrier controlled discharge at an atmospheric pressure of a plasma-producing gas such as nitrogen in the presence of silicon precursor, and forming a coating on the substrate, where the coating is made of an alloy composition having silicon, carbon, oxygen, nitrogen and hydrogen (SiC xO yN 2:H) and presenting an adhesive strength smaller than the uncoated substrate on its external surface. The discharge is generated by electrodes supplied with a generator providing a power of 0.4-4 kW and a frequency of 20-50 kHz. The process comprises exposing a surface of a substrate to a dielectric barrier controlled discharge at an atmospheric pressure of a plasma-producing gas such as nitrogen in the presence of silicon precursor, and forming a coating on the substrate, where the coating is made of an alloy composition having a silicon, carbon, oxygen, nitrogen and hydrogen (SiC xO yN 2:H) and presenting an adhesive strength smaller than the uncoated substrate on its external surface. The discharge is generated by electrodes supplied with a generator providing a power of 0.4-4 kW and a frequency of 20-50 kHz. The precursor is any silicon and except organo-silicon fluorinated compounds. The substrate has a scrolling speed of 10-30 m/minutes. The coating has a thickness of 5-10 nm.