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Method for realizing film in anisotropic magnetoresistance sensor for measurement or detection of e.g. magnetic anomaly, involves introducing non-zero residual mechanical stress in anisotropy direction parallel to surface of film
Method for realizing film in anisotropic magnetoresistance sensor for measurement or detection of e.g. magnetic anomaly, involves introducing non-zero residual mechanical stress in anisotropy direction parallel to surface of film
The method involves introducing a non-zero residual mechanical stress in an anisotropy direction parallel to a surface of a film (604) by treatment of an anisotropic magnetoresistance (AMR) material i.e. iron-nickel alloy, the film and/or two plastic supports (602-1, 602-2). The AMR material is deposited and mixed with another material on the supports. The latter material is subjected to a vacuum evaporation process. The film is subjected to a heat treatment process in the direction. The supports are subjected to durable plastic deformation in the direction. Independent claims are also included for the following: (1) a device for measurement or detection of a magnetic field (2) a method for measurement or detection of a magnetic field.
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