首页> 外国专利> Ag ALLOY FILM FOR REFLECTION COATING OR WIRING ELECTRODE, REFLECTION COATING OR WIRING ELECTRODE AND Ag ALLOY SPUTTERING TARGET FOR REFLECTION COATING OR WIRING ELECTRODE

Ag ALLOY FILM FOR REFLECTION COATING OR WIRING ELECTRODE, REFLECTION COATING OR WIRING ELECTRODE AND Ag ALLOY SPUTTERING TARGET FOR REFLECTION COATING OR WIRING ELECTRODE

机译:用于反射涂层或接线电极的Ag合金膜,用于反射涂层或接线电极的反射涂层和用于溅射涂层或接线电极的Ag合金溅射靶

摘要

PROBLEM TO BE SOLVED: To provide an Ag alloy film which is used in a reflection electrode or a wiring electrode, shows a low electric resistivity and a high reflectance and is excellent in oxidation resistance to a cleaning treatment, e.g. UV irradiation or Oplasma treatment.SOLUTION: An Ag alloy film is formed on a substrate, is used in a reflection electrode or a wiring electrode and contains at least one of more than 2.0 atom% and equal to or less than 2.7 atom% of In, more than 2.0 atom% and equal to or less than 3.5 atom% of Zn, more than 0.5 atom% and equal to or less than 1.4 atom% of Ge. The Ag alloy film preferably contains 0.01-1.0 atom% of Bi further.
机译:解决的问题:提供一种用于反射电极或配线电极的Ag合金膜,该Ag合金膜显示出低电阻率和高反射率,并且对于例如清洗处理等的耐氧化性优异。解决方案:Ag合金膜形成在基板上,用于反射电极或布线电极,并包含大于2.0原子%且小于或等于2.7原子%的In中的至少一种Zn大于2.0原子%且小于或等于3.5原子%,Ge大于0.5原子%且小于或等于1.4原子%。 Ag合金膜优选进一步含有0.01〜1.0原子%的Bi。

著录项

  • 公开/公告号JP2015028211A

    专利类型

  • 公开/公告日2015-02-12

    原文格式PDF

  • 申请/专利权人 KOBE STEEL LTD;

    申请/专利号JP20140131913

  • 发明设计人 OCHI MOTOTAKA;GOTO YASUSHI;SHIDA YOKO;

    申请日2014-06-26

  • 分类号C22C5/06;H01B5/02;H01B1/02;H01B5/14;G06F3/041;

  • 国家 JP

  • 入库时间 2022-08-21 15:34:22

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