首页> 外国专利> CHEMICAL RESISTANCE IMPROVEMENT METHOD OF POLYMER FILM, DEPOSITION METHOD OF POLYMER FILM, DEPOSITION APPARATUS OF POLYMER FILM AND WORKPIECE CONVEYANCE MECHANISM

CHEMICAL RESISTANCE IMPROVEMENT METHOD OF POLYMER FILM, DEPOSITION METHOD OF POLYMER FILM, DEPOSITION APPARATUS OF POLYMER FILM AND WORKPIECE CONVEYANCE MECHANISM

机译:聚合物膜的耐化学性改进方法,聚合物膜的沉积方法,聚合物膜的沉积装置和工件输送机制

摘要

PROBLEM TO BE SOLVED: To provide a chemical resistance improvement method of a polymer film capable of improving chemical resistance of the polymer film, and dispensing with a new separated processing unit for improving the chemical resistance of the polymer film.;SOLUTION: In a chemical resistance improvement method of a polymer film for improving chemical resistance of the polymer film which is deposited on a surface to be treated of a workpiece, and which is treated by a chemical, a heat treatment for improving chemical resistance of the polymer film is performed in a workpiece conveyance mechanism 130 for conveying the workpiece 1.;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:提供一种能够提高聚合物膜的耐化学性的聚合物膜的耐化学性的改进方法,并提供一种新的分离的处理单元以提高聚合物膜的耐化学性。聚合物膜的电阻改善方法,用于改善沉积在工件的待处理表面上并通过化学处理的聚合物膜的耐化学性,在其中进行用于提高聚合物膜的耐化学性的热处理。工件输送机构130,用于输送工件1。版权所有:(C)2016,日本特许厅

著录项

  • 公开/公告号JP2015178663A

    专利类型

  • 公开/公告日2015-10-08

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LTD;

    申请/专利号JP20140056947

  • 发明设计人 JO TOSHIHIKO;

    申请日2014-03-19

  • 分类号C23C14/58;H01L21/31;H01L21/312;C23C14/12;B65G49/07;H01L21/677;

  • 国家 JP

  • 入库时间 2022-08-21 15:33:05

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