PHOTO CATHODE TYPE ELECTRON BEAM SOURCE, MANUFACTURING METHOD THEREOF, AND PHOTO CATHODE TYPE ELECTRON BEAM SOURCE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide "a photo cathode type electron beam source, a manufacturing method thereof, and a photo cathode type electron beam source system", capable of generating electron beams with dramatically high luminance as compared with conventional electron beam sources and allowing the use life thereof to extend dramatically.;SOLUTION: The problem mentioned above can be solved by using a photo cathode type electron beam source 11. The photo cathode type electron beam source 11 is formed on a tip surface 20a of a cathode tip 20 and includes a junction layer 21 formed on the tip surface 20a, a photoelectron emission layer 22 formed on one surface 21a of the junction layer 21, and a protection processing layer 23 formed on one surface 22a of the photoelectron emission layer 22. The junction layer 21 is made of a film of a material that does not react with the cathode tip 20 and does not react with a material comprising the photoelectron emission layer 22. The protection processing layer 23 is made of a passive film formed by the oxidation of a material that does not react with a material comprising the photoelectron emission layer 22.;COPYRIGHT: (C)2015,JPO&INPIT