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Novel absorber and composition for forming organic antireflection film containing the same
Novel absorber and composition for forming organic antireflection film containing the same
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机译:新型吸收剂和用于形成该有机吸收剂的有机抗反射膜的组合物
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摘要
The invention provides a novel absorber represented by the following chemical formula 1 and a composition for preparing an organic antireflective protecting layer comprising the same, wherein the absorber has excellent absorbency of reflective light generated in a lithography process for forming a fine pattern, in particular for forming an ultra fine pattern by the use of 248nmKrF excimer laser, and has a fine pattern for forming an organic anti-reflective film and forming a semiconductor element using thereof, the chemical formula 1 being shown in the description. In the above formula, various substituents are the same as defined in the description.
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